Micro & Nano Systems Integration Cluster - Publications

Patents (12 issued)

R. Menon and N. Brimhall, “Maskless nanoimprint lithography via reversible light-induced molecular mass-transport,” technology disclosure submitted March 3, 2011.

R. Menon and G. Kim, “Broadband diffractive optic and methods to design the same,” US provisional patent application filed October 15, 2010.

R. Menon and J-A. Dominguez-Caballero, “Ultra-high efficiency color-mixing and color-separation,” US provisional patent application filed September 27, 2010.

R. Menon and H. I. Smith, "System and method for absorbance modulation lithography (Divisional)," US 7,714,988, May 11, 2010.

R. Menon and H. I. Smith, "System and method for absorbance modulation lithography," US 7,713,684, May 11, 2010.

R. Menon and H. I. Smith, "System and method for contrast-enhanced zone-plate-array lithography (Divisional)," US 7,667,819, February 23, 2010.

R. Menon and H. I. Smith, "System and method for contrast-enhanced zone-plate-array lithography," US 7,666,580, February 23, 2010.

R. Menon and H. I. Smith, "Imaging system and method employing beam folding," US 7,405,806, June 29, 2008.

R. Menon, D. Gil, D. J. D. Carter, J. G. Goodberlet, J. T. Hastings, G. Barbastathis and H. I. Smith, "System and Method for Fabrication and Replication of Diffractive Optical Elements for Maskless Lithography," US 7,348,104, March 25, 2008.

D. Gil, R. Menon, D. J. D. Carter, H. I. Smith and G. Barbastathis, "System and Method for Maskless Lithography using an array of sources and an array of focusing elements," US 7,304,318, December 4, 2007.

R. Menon, D. Gil, G. Barbastathis and H. I. Smith, "System and Method for Manipulating Micro-Particles using Electromagnetic Fields," US 7,193,782, March 20, 2007.

R. Menon, D. Gil, D. J. D. Carter, G. Barbastathis and H. I. Smith, "System and Method for Holographic Fabrication and Replication of Diffractive Optical Elements for Maskless Lithography," US 7,160,673, January 9, 2007.

R. Menon, D. Gil, G. Barbastathis and H. I. Smith, "System and Method for proximity-effect correction in imaging systems," US 7,148,496, December 12, 2006.

R. Menon, D. Gil, D. J. D. Carter and H. I. Smith, "System and Method for Maskless Lithography using an Array of Improved Diffractive Focusing Elements," US 6,960,773, November 1, 2005.

D. Gil, R. Menon, D. J. D. Carter, H. I. Smith and G. Barbastathis, "System and Method for Maskless Lithography using an array of sources and an array of focusing elements," US 6,894,292, May 17, 2005.

R. Menon, T. L. Andrew and F. Stellacci, "Optical 3-D nanopatterning using multi-color saturable transitions," Technology disclosure submitted December 2008.

R. Menon, "Ultra-high efficiency multi-junction solar cells using polychromatic diffractive concentrators," US Patent application filed October 17, 2008.

R. Menon, "Superresolution imaging using multiple wavelengths," US Patent application filed October 17, 2008.

R. Menon, P. Rogge, and H-Y. Tsai, "Multiple-wavelength, binary diffractive lenses," US Patent application filed October 17, 2008.

R. Menon, "Absorbance modulation nanomanipulation," Technology disclosure filed August 2006.

R. Menon, and H. I. Smith, "Nanoscale Imaging via absorbance modulation," Patent application filed August 2008.

R. Menon, "Resolution enhancement in optical lithography using absorbance-modulation-enabled multiple exposures," Patent application filed November 2006.

G. Barbastathis, R. Menon, and H. I. Smith, "Phase-Shift-Masked Zone-Plate-Array Lithography (PSM-ZPAL)," Provisional patent application filed on February 7, 2005

Book Chapters

H. I. Smith, R. Menon, M. Walsh, and F. Zhang, "Zone-Plate-Array Lithography," Book chapter in Emerging Lithographic Technologies for Nanopatterning, CRC Press/Taylor & Francis (in preparation).

Journal Publications

H-Y. Tsai, S. W. Thomas, III and R. Menon, "Scanning optical nanoscopy with optically confined probes," Opt. Exp. 18(15), 16015 (2010).

R. Menon, "Towards diffraction-unlimited optical nanopatterning," Optics and Photonics News, December 17, 2009.

T. L. Andrew, H-Y. Tsai and R. Menon, "Confining light to deep sub-wavelength dimensions to enable optical nanopatterning," Science, 324, 917 (2009).

R. Menon, P. Rogge, and H-Y. Tsai, "Design of diffractive lenses that generate optical nulls without phase singularities," J. Opt. Soc. Am. A, 26(2), 297 (2009).

H-Y. Tsai, E. E. Moon and R. Menon, "Far-field optical imaging at the nanoscale via Absorbance Modulation," Novel Techniques in Microscopy, OSA Technical Digest (2009).

H-Y. Tsai, H. I. Smith, and R. Menon, "Reduction of focal-spot size using dichromats in absorbance modulation," Opt. Lett., 33(24), 2916 (2008).

F. Y. Ogrin, E. Sirotkin, G. van der Laan, G. Beutier, C. A. Ross, W. Jung, and R. Menon, "Soft X-ray resonant magnetic scattering investigation of stable magnetic configurations in patterned rings," J. Appl. Phys., 103, 07E909 (2008).

H-Y. Tsai, G. M. Wallraff, and R. Menon, "Spatial-frequency multiplication via absorbance modulation," Appl. Phys. Lett., 91(9), 094103 (2007).

R. Menon, H-Y Tsai and S. W. Thomas III, "Far-field generation of localized light fields using absorbance modulation," Phys. Rev. Lett., 98, 043905 (2007).

R. Menon, H-Y Tsai and H. I. Smith, "Patterning and Imaging at the nanoscale with far-field optics via absorbance modulation," Photonic Metamaterials: From Random to Periodic, OSA Technical Digest (Optical Society of America, 2007).

H-Y Tsai, H. I. Smith, and R. Menon, "Fabrication of spiral-phase diffractive elements using scanning electron-beam lithography," J. Vac. Sci. Technol. B, 25(6), 2068-2071 (2007).

F. Y. Ogrin, S. M. Weekes, B. Cubitt, A. Wildes, A. Drew, C. A. Ross, W. Jung, R. Menon, and B. Toperverg, "Polarised neutron reflectivity investigation of periodic magnetic rings," IEEE T. Magn., 43(6), 2731-2733 (2007).

M. D. Galus, E. E. Moon, H. I. Smith and R. Menon, "Replication of diffractive-optical arrays using photocurable nanoimprint lithography," J. Vac. Sci. Technol. B, 24 (6), 2960-2963 (2006).

R. Menon, and H. I. Smith, "Absorbance-modulation optical lithography," J. Opt. Soc. Am. A, 23(9), 2290-2294 (2006).

H. I. Smith, R. Menon, A. Patel, D. Chao, M. Walsh, and G. Barbastathis "Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography," Microelectron. Eng., 83(4-9), 956-961 (2006).

R. Menon, D. Gil, and H. I. Smith, "Experimental characterization of focusing by high-numerical-aperture zone plates," J. Opt. Soc. Am. A, 23(3), 567-571 (2006).

D. Chao, A. Patel, T. Barwicz, H. I. Smith, and R. Menon, "Immersion Zone-Plate-Array Lithography," J. Vac. Sci. Technol. B, 23(6), 2657-2661 (2005).

W. Jung, F. J. Castaño, D. Morecroft, C. A. Ross, R. Menon, and H. I. Smith, "Magnetization reversal in single-layer and exchange-biased elliptical-ring arrays," J. Appl. Phys., 97(10), 10K113-1-3 (2005).

R. Menon, D. Gil, and H. I. Smith, "Photon-sieve lithography," J. Opt. Soc. Am. A, 22(2), 342-345 (2005).

H. I. Smith, R. Menon, A. Patel, D. Chao, M. Walsh, and G. Barbastathis "Enabling nanoscale science and engineering via highly flexible, low-cost, maskless lithography," Proc. SPIE, v. 6002, 60020B (2005).

R. Menon, A. Patel, D. Chao, M. Walsh, and H. I. Smith, "Zone-Plate- Array Lithography (ZPAL): Optical Maskless Lithography for cost-effective patterning," Emerging Lithographic Technologies IX, Proc. SPIE, v. 5751, 330-339 (2005).

R. Menon, A. Patel, and H. I. Smith, "Maskless optical lithography using MEMS-based spatial light modulators," MOEMS Display and Imaging Systems III, Proc. SPIE, v. 5721, 53-63 (2005).

R. Menon, A. Patel, D. Gil, and H. I. Smith, "Maskless lithography," Materials Today, 26-33, Feb 2005.

R. Menon, A. Patel, E. E. Moon, and H. I. Smith, "An alpha-prototype system for zone-plate-array lithography," J. Vac. Sci. Technol. B, 22(16), 3032-3037 (2004).

R. Menon, E. E. Moon, M. K. Mondol, F. J. Castano, and H. I. Smith, "Scanning-spatial-phase alignment for zone-plate-array lithography," J. Vac. Sci. Technol. B, 22(16), 3382-3385 (2004).

W. Jung, F. J. Castano, C. A. Ross, R. Menon, A. Patel, E. E. Moon, M. K. Mondol, and H. I. Smith, "Elliptical ring magnetic arrays fabricated using zone-plate-array lithography," J. Vac. Sci. Technol. B, 22(16), 3335-3338 (2004).

D. Gil, R. Menon, and H. I. Smith, "The promise of diffractive optics in maskless lithography," Microelectron. Eng., v. 73-74, 35-41 (2004).

R. Menon, A. Patel, G. Barbastathis, D. Gil, and H. I. Smith, "Maskless zone-plate-array lithography (ZPAL): For enhanced creativity in nanostructures fabrication and research ," Digest of papers: Microprocesses and Nanotechnology, 338 (2004).

R. Menon, D. Gil, D. J. D. Carter, A. Patel and H. I. Smith, "Zone-Plate Array Lithography (ZPAL): A maskless fast-turn-around system for Microoptic Device Fabrication," MOEMS Display and Imaging Systems, Proc. SPIE v. 4984, 10-17 (2003).

D. Gil, R. Menon and H. I. Smith, "The Case for Diffractive Optics in Maskless Lithography," J. Vac. Sci. Technol. B, 21(6), 2810-2814, (2003).

D. Gil, R. Menon and H. I. Smith, "Fabrication of High-Numerical Aperture Phase Zone Plates with a single Lithography Exposure and No Etching," J. Vac. Sci. Technol. B, 21(6), 2956-2960 (2003).

D. Gil, R. Menon, X. Tang, H. I. Smith, and D. J. D. Carter, "Parallel Maskless Optical Lithography for Prototyping, Low-Volume Production, and Research," J. Vac. Sci. Technol. B, 20(6), 2597-2601 (2002).

R. A. Forber, Z. W. Chen, R. Menon, R. Grygier, S. Mrowka, I. C. E. Turcu, C. J. Gaeta, K. Cassidy, and Henry I. Smith, "Collimated Point-Source X-ray Nanolithography," J. Vac. Sci. Technol. B, 20(6), 2984-2990 (2002).

R. Menon, D. J. D. Carter, D. Gil, and H. I. Smith, "Zone-Plate-Array Lithography (ZPAL): Simulations for System Design," X-Ray Microscopy: Proc. of the VIth International Conference on X-Ray Microscopy, 647-652, American Institute of Physics (2000).

D. J. D. Carter, D. Gil, R. Menon, and H. I. Smith, "Maskless nanolithography with diffractive optics: Zone-Plate-Array lithography (ZPAL)," Trends in Optics and Photonics: Diffractive Optics and Micro-Optics. v. 41, 105-107, Opt. Soc. America (2000).

H. I. Smith, D. J. D. Carter, M. Meinhold, E. E. Moon, M. H. Lim, J. Ferrera, M. Walsh, D. Gil, and R. Menon, "Soft X-rays for Deep Sub-100 nm Lithography, With and Without Masks," Microelectron. Eng., 53, 77-84 (2000).

D. Gil, R. Menon, D. J. D. Carter, and H. I. Smith, "Lithographic Patterning and Confocal Imaging with Zone Plates," J. Vac. Sci. Technol. B, 18(6), 2881-2885 (2000).

H. I. Smith, D. J. D. Carter, J. Ferrera, D. Gil, J. T. Hastings, M. H. Lim, M. Meinhold, R. Menon, E. E. Moon, C. A. Ross, T. Savas, M. Walsh, and F. Zhang, "Soft X-rays for Deep Sub-100 nm Lithography, With and Without Masks," Proc. Materials Research Society Symposium, v. 584, 11-21 (2000).

D. J. D. Carter, D. Gil, R. Menon, I. J. Djomehri, and H. I. Smith, "Zone-Plate Array Lithography (ZPAL): A New Maskless Approach," Emerging Lithographic Technologies III: Proc. SPIE, v. 3676, 324-332 (1999).

D. J. D. Carter, D. Gil, R. Menon, M. K. Mondol, H. I. Smith, and E. H. Anderson "Maskless Parallel Patterning with Zone-Plate Array Lithography (ZPAL)," J. Vac. Sci. Technol. B, 17(6), 3449-3452 (1999).

T. C. Au-Yeung, C. H. Kam, Z. F. Shi, R. Menon, and R. A. Straughan, "Energy levels of impurity magnetopolarons in parabolic quantum wires," Phys. Lett. A, 238, 66-72 (1998).

T. C. Au-Yeung, C. H. Kam, R. Menon, and Z. F. Shi, "Bound state energy calculations of magnetopolarons in strongly confined parabolic quantum wires," Phys. Lett. A, 250(1-3), 185-190 (1998).

T. C. Au-Yeung, Z. F. Shi, C. H. Kam, R. Menon, and R. A. Straughan, "A variational perturbative approach to the impurity magnetopolarons in parabolic quantum wires," J. Phys. Soc. Jpn., 67(2), 519-524 (1998).

Presentations

R. Menon, “Patterning and imaging beyond the far-field diffraction limit,” Pacific-Rim CLEO, Sydney, Australia, August 2011 (invited).

R. Menon, Pan-American Advanced Studies Institute (PASI) on “Frontiers in Imaging Science,” Universidad Nacional de Colombia, Bogota, June 2011 (invited).

G. Kim and R. Menon, National Conference on Undergraduate Reesarch, Ithaca, NY, March, 2011.

R. Menon, "Breaking the far-field diffraction barrier with photochemistry," University of Miami, Chemistry Dept. seminar, March 12, 2011, Coral Gables, FL (invited).

R. Menon, "Reading and writing at the nanoscale via novel photochemistry," Politecnico di Milano Chemical Engineering Dept. seminar, February 14, 2011, Milan, Italy (invited).

N. Brimhall, T. L. Andrew R. V. Manthena and R. Menon, "Novel photochemistry enables deep sub-wavelength optical nanolithography," IEEE Lithgraphy Workshop, November 7-11, 2010, Kauai, HI (invited poster).

N. Brimhall, T. L. Andrew R. V. Manthena and R. Menon, "On breaking the Abbe diffraction limit in optical nanopatterning," OSA Annual Meeting, October 28, 2010, Rochester, NY (invited).

N. Brimhall, T. L. Andrew and R. Menon, "Sub-wavelength optical patterning via optical-saturable transformations," EIPBN Conference, June 1-4, 2010, Anchorage, AK.

R. V. Manthena, M. Diwekar, N. Brimhall, T. L. Andrew and R. Menon, "Deep sub-wavelength patterning via absorbance modulation," EIPBN Conference, June 1-4, 2010, Anchorage, AK (poster).

R. Menon, "Absorbance modulation: an approach to surpassing the diffraction barrier," MIT Optics and Quantum Electronics Seminar, March 3, 2010, Cambridge, MA (invited).

R. Menon, "On breaking the far-field diffraction barrier in optical nanopatterning and nanoscopy," Florida Atlantic University Physics Colloqium, February 26, 2010, Boca Raton, FL (invited).

R. Menon, "Breaking the far-field diffraction barrier: Optical nanopatterning and nanoscopy enabled by chemistry," University of Utah Analytical/Physical Chemistry Seminar, October 26, 2009 (invited).

R. Menon, "Patterning and Imaging Nanostructures with Light," NanoUtah 2009, October 15-16, Salt Lake City, UT (invited).

R. Menon, OSA Annual Meeting, October 11-15, 2009, San Jose, CA.

R. Menon, ASME Nanomanufacturing Panel, Sep. 2, 2009, San Diego, CA (invited).

R. Menon, "Sculpting nanostructures with light," IEEE Lithography Workshop, June 28-July 2, 2009 Coeur d'Alene, ID (invited).

R. Menon, "Polychromatic concentrators for ultra-high efficiency solar cells," Optics and Photonics for advanced energy technology, May 24-25, Cambridge, MA (poster).

R. Menon, "Sculpting nanostructures with light," EIPBN 2009, May 26-May 29, 2009, Marco Island, FL (invited).

R. Menon, H-Y. Tsai, and T. Andrews, "Generating optical near-fields from afar via absorbance modulation," OSA Annual meeting, October 19-23, 2008, Rochester, NY.

R. Menon, "Patterning and Imaging at the Nanoscale with Far-field Optics via Absorbance Modulation," IEEE NANO 2008, August 18-21, 2008, Arlington, TX (invited).

M. Walsh, F. Zhang, H. I. Smith, and R. Menon, "A prototype commercial system for massively parallel maskless zone-plate-array lithography (ZPAL)," EIPBN 2008, May 30-June 3, 2008, Portland, OR (poster).

R. Menon, "High throughput nanoscale imaging with photons," IDEA Stream 2008, MIT Deshpande Center Symposium, April 29, 2008, Boston, MA (Plenary session).

R. Menon, "Towards Optical Nanoscale Imaging," DARPA MTO Workshop on Non-destructive testing of ICs, April 24, 2008, Arlington, VA (invited).

H. I. Smith, R. Menon, M. Walsh, and F. Zhang, "Commercialization of maskless zone-plate-array lithography and its extension to the limits of lithography," IEEE Lithography Workshop, December 9-13, 2007, Puerto Rico (keynote).

H-Y. Tsai, P. Rogge, and R. Menon, "Absorbance modulation imaging," MIT Deshpande Center Open House, November 29, 2007, Cambridge, MA (poster, invited).

R. Menon, H-Y Tsai, and H. I. Smith, "Patterning and imaging at the nanoscale with far-field optics via absorbance modulation," Photonic Metamaterials: From random to periodic (META), June 4-7, 2007, Jackson Hole, WY.

R. Menon, "Zone-Plate-Array Lithography (ZPAL): High-Resolution, High-Throughput Optical-Maskless Patterning," Advanced Materials and Nanotechnology, February 2007, Wellington, New Zealand (invited).

R. Menon, "Patterning and Imaging at the Nanoscale with far-field optics," Nanolithography and Plasmonics Workshop, February 19-20, 2007, Christchurch, New Zealand (invited).

R. Menon, "Towards optical patterning at near-molecular resolution," MIT Optics and Quantum Electronics Seminar, November 2006, Cambridge, MA (invited).

R. Menon, "Towards optical patterning at near-molecular resolution," IBM Science Colloquium, October, 2007, San Jose, CA. (invited).

R. Menon, "Optical Maskless Nanolithography for Research, Manufacturing and Mask-making," IEEE Lithography Workshop, August 2006, Prince Edward Island, Canada. (invited).

R. Menon, "Towards patterning with photons at molecular resolution," EIPBN, June 2006, Baltimore, MD (invited).

M. D. Galus, E. E. Moon, H. I. Smith, and R. Menon, "Replication of diffractive-optical arrays using photocurable nanoimprint lithography," EIPBN, June 2006, Baltimore, MD. (poster).

R. Menon, "Optical-Maskless patterning for Nanostructuring," Photonics West, January 2006, San Jose, CA.

Lab Contact Information

36 S. Wasatch Drive
Salt Lake City, UT 84112
Phone: 801-587-1566
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Last Updated: 3/14/13